Diffusion Behavior of Ti in Cu Films Deposited on Ti Substrate

Effects of Cu on the microstructural and mechanical properties of sputter deposited Ni-Ti thin films

The microstructure of sputter deposited Ti-rich Ni-Ti thin films doped with Cu in the range 020.4 at.% and annealed for 1 h at 500 and 600°C has been investigated and correlated with the mechanical properties of the films measured by depth-sensing nanoindentation. X-ray diffraction analysis showed the microstructural evolution of Ni-Ti thin films when doped with Cu and annealed at different tem...

Investigation on multilayered chemical vapor deposited Ti/TiN films as the diffusion barriers in Cu and Al metallization

Characterization of diamond-like carbon films deposited on commercially pure Ti and Ti–6Al–4V

The diamond-like carbon (DLC) films deposited on the articulating surface of medical-grade Ti and Ti–6Al–4V were characterized. The DLC films were synthesized by r.f. plasma assisted chemical vapor deposition (PACVD) using C6H6 at 10 mTorr. For wear tests, the ball-ondisk type wear tester was employed by wearing a 5-mm diameter ruby ball against a rotating metal disk. The DLC coating dramatical...

Corrosion Characteristics of a - Ti and Ti 2 Cu Composing Ti - Cu Alloys

A series ef binary Ti-Cu alloys containing 5-20 mass% Cu was prepared, and the corresien behavior of a-Ti and Ti2Cu composing the Ti-Cu alloys were examined based on the anodic polarization curves and released iens in O.9% NaCl and 1% lactic acid solutions. In both selutions, the Ti-Cu alloys showed the same anodic polarization curves as titanium in the conditien below 1.4 V. Hewever, precipita...

Photoelectrochemical Behavior of Electrophoretically Deposited Hematite Thin Films Modified with Ti(IV).

Doping hematite with different elements is a common strategy to improve the electrocatalytic activity towards the water oxidation reaction, although the exact effect of these external agents is not yet clearly understood. Using a feasible electrophoretic procedure, we prepared modified hematite films by introducing in the deposition solution Ti(IV) butoxide. Photoelectrochemical performances of...